SANTA CLARA, Calif.--(BUSINESS WIRE)--Anchor Semiconductor Inc. today introduced an easy-to-adopt Optical Proximity Correction (OPC) acceleration tool that will significantly shorten OPC cycle time ...

SAN JOSE, Calif.--(BUSINESS WIRE)--Canon U.S.A., Inc., a leader in digital imaging, has announced its entry into the semiconductor back-end manufacturing tool market with the launch of the FPA-5510iV ...

Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of ...

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging ...

“In order to continue scaling devices to meet Moore's law, chip manufacturers are extending 193nm immersion lithography using multi-patterning techniques and are assessing non-traditional patterning ...

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...