SAN DIEGO — In a move to compete against extreme ultraviolet (EUV) technology for next-generation lithography applications, JMAR Technologies Inc. today announced plans to acquire Semiconductor ...

California-based JMAR Technologies has demonstrated a light source for next-generation lithography (NGL) equipment based on extreme ultraviolet (EUV) light that the company reckons can get into the ...

If Moore's Law is maintained, lithography tools will need to produce 32 Gbit memory chips and 20 GHz processors with feature sizes of 20-50 nm by 2009. With a question mark hanging over the viability ...

A University of Central Florida research team has made a substantial inroad toward establishing extreme ultraviolet light (EUV) as a primary power source for manufacturing the next generation of ...

The first reflection microscope to use an EUV laser illumination source could provide chip manufacturers with a rapid, on-site method for inspecting lithography masks. A tabletop extreme ultraviolet ...