TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

ASML Optics has shown the first patterns using the full-field EUV (extreme-ultraviolet) alpha demo tool at the State University of New York—Albany’s College of Nanoscale Science and Engineering. The ...

How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...

A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...

Applied Materials announced a new chip fab machine that complements ASML's EUV lithography equipment. Applied's work could reduce the need for EUV in some instances. Rather than detract from ASML, ...

There's a conventional wisdom among investors that Intel (NASDAQ: INTC) is significantly behind Taiwan Semiconductor ...

The first full-scale prototype machine for making ICs by using extreme-ultraviolet (EUV) light has been completed, proving that the technology works. This breakthrough should lead to microprocessors ...

A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...